PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE METAL COMPLEX, COATING LIQUID, AND METHOD FOR MANUFACTURING METAL OXIDE THIN FILM PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive composition from which a metal oxide thin film pattern of high contrast in which a crack is hardly generated, is manufactured, and also to provide a photosensitive metal complex, a coating liquid, and a method for manufacturing the metal oxide thin film pattern.

SOLUTION: The photosensitive composition is represented by a formula (1). At least one of R1to R4in the formula (1) is any one of formulae (2) to (5). R13in the formulae (2) to (4) is represented by a formula (6) or a formula (7). R1to R4in the formula (1) which are not any of the formulae (2) to (5) and R5to R8in the formulae (6) to (7) are respectively any one of the following (a1) to (a14). Y in the formula (5) is any one of the following (b1) to (b5). R9to R10in the formula (6) and R9to R12in the formula (7) are respectively any one of the following (c1) to (c15).

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