发明名称 INTERNAL SEMICONDUCTIVE LAYER, INSULATING TUBE UNIT USING THE SAME, AND MOLDING DIE FOR MOLDING THE INTERNAL SEMICONDUCTIVE LAYER
摘要 PROBLEM TO BE SOLVED: To provide an internal semiconductive layer capable of suppressing the generation of electric breakage and shortening a polishing work time of an uneven portion of its surface without causing a parting line at both end portions as portions having high electric field, to provide a normal temperature shrinkage type insulating tube unit using the internal semiconductive layer, and to provide a molding die for molding the internal semiconductive layer. SOLUTION: The internal semiconductive layer 30 is disposed in a normal temperature shrinkage type insulating tube unit 10 for covering a connection portion between conductors of power cables and is cylindrically made by molding. It also has a parting line 180 which is formed by molding and disposed along a direction crossing an axial direction CL of the internal semiconductive layer 30 in the center portion of the internal semiconductive layer 30. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010259134(A) 申请公布日期 2010.11.11
申请号 JP20090102632 申请日期 2009.04.21
申请人 VISCAS CORP;FUJIKURA LTD;FURUKAWA ELECTRIC CO LTD:THE 发明人 TAMURA TOSHIYUKI;TAKAOKA ISAO
分类号 H02G15/184;B29C33/76;B29K21/00 主分类号 H02G15/184
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