发明名称 |
INTERNAL SEMICONDUCTIVE LAYER, INSULATING TUBE UNIT USING THE SAME, AND MOLDING DIE FOR MOLDING THE INTERNAL SEMICONDUCTIVE LAYER |
摘要 |
PROBLEM TO BE SOLVED: To provide an internal semiconductive layer capable of suppressing the generation of electric breakage and shortening a polishing work time of an uneven portion of its surface without causing a parting line at both end portions as portions having high electric field, to provide a normal temperature shrinkage type insulating tube unit using the internal semiconductive layer, and to provide a molding die for molding the internal semiconductive layer. SOLUTION: The internal semiconductive layer 30 is disposed in a normal temperature shrinkage type insulating tube unit 10 for covering a connection portion between conductors of power cables and is cylindrically made by molding. It also has a parting line 180 which is formed by molding and disposed along a direction crossing an axial direction CL of the internal semiconductive layer 30 in the center portion of the internal semiconductive layer 30. COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2010259134(A) |
申请公布日期 |
2010.11.11 |
申请号 |
JP20090102632 |
申请日期 |
2009.04.21 |
申请人 |
VISCAS CORP;FUJIKURA LTD;FURUKAWA ELECTRIC CO LTD:THE |
发明人 |
TAMURA TOSHIYUKI;TAKAOKA ISAO |
分类号 |
H02G15/184;B29C33/76;B29K21/00 |
主分类号 |
H02G15/184 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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