发明名称 |
COMPOSITION AND METHOD FOR LOW TEMPERATURE DEPOSITION OF SILICON-CONTAINING FILMS SUCH AS FILMS INCLUDING SILICON, SILICON NITRIDE, SILICON DIOXIDE AND/OR SILICON-OXYNITRIDE |
摘要 |
Silicon precursors for forming silicon-containing films in the manufacture of semiconductor devices, such as low dielectric constant (k) thin films, high k gate silicates, low temperature silicon epitaxial films, and films containing silicon nitride (Si3N4), siliconoxynitride (SiOxNy) and/or silicon dioxide (SiO2). The precursors of the invention are amenable to use in low temperature (e.g., <500° C.) chemical vapor deposition processes, for fabrication of ULSI devices and device structures.
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申请公布号 |
US2010285663(A1) |
申请公布日期 |
2010.11.11 |
申请号 |
US20100838441 |
申请日期 |
2010.07.17 |
申请人 |
ADVANCED TECHNOLOGY MATERIALS, INC. |
发明人 |
WANG ZIYUN;XU CHONGYING;LAXMAN RAVI K.;BAUM THOMAS H.;HENDRIX BRYAN;ROEDER JEFFREY |
分类号 |
H01L21/285;C07F7/02;C07F7/10;C07F7/12;C23C16/30;C23C16/34;C23C16/40;C30B25/02;C30B29/06;H01L21/31;H01L21/314;H01L21/316;H01L21/318 |
主分类号 |
H01L21/285 |
代理机构 |
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地址 |
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