发明名称 Makeup-Assisting Patch and Makeup Method Using the Patch
摘要 A makeup-assisting patch having a layer structure that a pressure sensitive adhesive layer is provided on one surface of a base layer, wherein (1) the base layer is a layer of a polyurethane elastomer having a glass transition temperature of 0° C. or lower, (2) the pressure sensitive adhesive layer is an acrylic pressure sensitive adhesive layer composed of a copolymer containing at least one monomer unit selected from the group consisting of an alkyl acrylate and an alkyl methacrylate each having an alkyl group having 8 to 12 carbon atoms in a proportion of 70% by weight or more, and (3) the thickness of the base layer is 1 to 10 μm, the thickness of the pressure sensitive adhesive layer is 1 to 15 μm, and the total thickness of these both layers is 2 to 20 μm.
申请公布号 US2010282269(A1) 申请公布日期 2010.11.11
申请号 US20080676951 申请日期 2008.06.03
申请人 UCHIDA KAZUKO;WATANABE SHUICHI;TAKAGI YASUYO;KANESHIGE MAMI;FUKANO KENJI;FUJISAWA HIROMICHI 发明人 UCHIDA KAZUKO;WATANABE SHUICHI;TAKAGI YASUYO;KANESHIGE MAMI;FUKANO KENJI;FUJISAWA HIROMICHI
分类号 A45D40/30 主分类号 A45D40/30
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