| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus in which an imaging error and/or focusing error of the projection system, caused by movement of the meniscus, is reduced, if not eliminated. <P>SOLUTION: The apparatus has a projection system which is configured to project a patterned radiation beam onto a target portion of the substrate, and having a lower surface. The apparatus also has a liquid confinement structure defining, in use, in part with the lower surface and the substrate and/or substrate table, an immersion space, and the immersion space has, in use, a liquid meniscus between a part of the lower surface facing a surface of the liquid confinement structure and a facing surface of the liquid confinement structure facing the part of the lower surface. The apparatus also has a pinning surface having a plurality of meniscus pinning features, the pinning surface being part of or on the part of the lower surface, or part of or on the facing surface of the liquid confinement structure, or part of or on both. <P>COPYRIGHT: (C)2011,JPO&INPIT |
