| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of inspecting defects and a defect inspection apparatus for detecting defects with high sensitivity and a high capture rate even on diverse patterns existing on a wafer. SOLUTION: In the defect inspection apparatus, an illuminating optical system includes two systems, namely a coherent illumination system using a laser 5 and an incoherent illumination system using LEDs 6a, 6b, 6c, 6d. A detection system is branched into optical paths corresponding to each illumination light; spatial modulation elements 55a, 55b are disposed in the detection optical paths, respectively; scattering light disturbing sensitivity is blocked by the spatial modulation elements 55a, 55b; and the scattering light having passed through the spatial modulation elements 55a, 55b is detected by image sensors 90a, 90b disposed in the optical paths, respectively. Then, the images detected by the two image sensors 90a, 90b are compared with each other to determine a defect candidate. COPYRIGHT: (C)2011,JPO&INPIT |
