| 摘要 |
PROBLEM TO BE SOLVED: To provide an illumination device for surface inspection performing efficient illumination for inspecting the flaw of the surface, especially edge part of a substrate such as a surface polished wafer. SOLUTION: In the illumination device for surface inspection of an inspection device for inspecting the inspection target region of the substrate such as the wafer while scanning the same by relatively moving the substrate with respect to irradiation light, a reflecting member, the cross section of which has a reflecting surface having a curve shape such as a parabola (or oval) shape, is provided in order to reflect the irradiation light in the relative moving direction (scanning direction) of the substrate in the irradiation light from an illumination light source so as to condense the same to the surface of the substrate, and the inspection target part of the substrate is effectively irradiated with the irradiation light by reflecting the light from the light source so as to condense the same to the surface inspection region of the substrate. Then, by condensing the light in the scanning direction from the light source to the inspection part of the substrate to perform efficient illumination, the scattered light from the inspection part is increased to enable more accurate inspection. COPYRIGHT: (C)2011,JPO&INPIT |
