SYSTEMS AND METHODS FOR FABRICATING HIGH-DENSITY CAPACITORS
摘要
The present invention describes systems and methods for fabricating high-density capacitors. An exemplary embodiment of the present invention provides a method for fabricating a high-density capacitor system including the steps of providing a substrate and depositing a nanoelectrode particulate paste layer onto the substrate. The method for fabricating a high-density capacitor system further includes sintering the nanoelectrode particulate paste layer to form a bottom electrode. Additionally, the method for fabricating a high-density capacitor system includes depositing a dielectric material onto the bottom electrode with an atomic layer deposition process. Furthermore, the method for fabricating a high-density capacitor system includes depositing a conductive material on the dielectric material to form a top electrode.
申请公布号
WO2010129186(A1)
申请公布日期
2010.11.11
申请号
WO2010US32107
申请日期
2010.04.22
申请人
GEORGIA TECH RESEARCH CORPORATION;PULUGURTHA, MARKONDEYARAJ;FENNER, ANDREAS;MALIN, ANNA;GOUD, DASHARATHAM;TUMMALA, RAO;MEDTRONIC, INC.