SUBSTRATE PROCESSING APPARATUS

摘要

PURPOSE: A substrate processing apparatus is provided to improve the thermal treatment efficiency of a substrate by easily cooling a plurality of penetration containers through the circulation of cold air or coolant. CONSTITUTION: A lower chamber(100) provides a space for processing a substrate. An upper chamber(200) is combined with the upper side of the lower chamber and has a plurality of heat sources for supplying heat to the substrate. A plurality of penetration containers(400) are combined with the upper chamber and surrounds and protects the plurality of the heat sources protruded to the process space. The thickness of the bottom of the penetration container becomes thin far away from the center of the upper chamber.