| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition satisfying high sensitivity, high resolution, good pattern form, good line edge roughness and reduction of outgassing at the same time in a superfine region, in particular, in electron beam, X-ray or EUV ray lithography, and to provide a resist film and a pattern forming method using the resist film. <P>SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition contains a resin (P) having the following repeating units (A)-(C) and a solvent having a boiling temperature of 150°C or lower. A resist film of the composition and a pattern-forming method using the composition are provided. The repeating units are: (A) a repeating unit containing a group for decomposing and forming an acid upon irradiation with ah actinic ray or radiation; (B) a repeating unit containing a group for decomposing and forming a carboxylic acid by the action of an acid; and (C) a repeating unit containing a carbon-carbon unsaturated bond. <P>COPYRIGHT: (C)2011,JPO&INPIT |
