ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition having an effect in the improvement of tapered profile of a resist pattern and enabling formation of a pattern with good LER performance, and a pattern forming method using the composition.

SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin capable of increasing a solubility of the resin in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, wherein the compound capable of generating an acid upon irradiation with an actinic ray or radiation is contained in an amount of 10 to 30 mass% based on the entire solid content of the actinic ray-sensitive or radiation-sensitive resin composition. The pattern forming method uses the composition.

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