发明名称 COMPOUND, PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PROCESSED SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive composition which has a low viscosity prior to hardening and is excellent in mechanical strength after hardening. SOLUTION: The photosensitive composition includes: at least one of a compound 1, a compound 2, a compound 3, and a compound 4; and a photoinitiator. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010254795(A) 申请公布日期 2010.11.11
申请号 JP20090106223 申请日期 2009.04.24
申请人 FUJIFILM CORP 发明人 HATAKEYAMA AKIRA;FUJITA AKINORI
分类号 C08F20/20;C07C69/54;C07F7/18;C08F2/48;C08F265/06;H01L21/027 主分类号 C08F20/20
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