发明名称 |
COMPOUND, PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PROCESSED SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive composition which has a low viscosity prior to hardening and is excellent in mechanical strength after hardening. SOLUTION: The photosensitive composition includes: at least one of a compound 1, a compound 2, a compound 3, and a compound 4; and a photoinitiator. COPYRIGHT: (C)2011,JPO&INPIT
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申请公布号 |
JP2010254795(A) |
申请公布日期 |
2010.11.11 |
申请号 |
JP20090106223 |
申请日期 |
2009.04.24 |
申请人 |
FUJIFILM CORP |
发明人 |
HATAKEYAMA AKIRA;FUJITA AKINORI |
分类号 |
C08F20/20;C07C69/54;C07F7/18;C08F2/48;C08F265/06;H01L21/027 |
主分类号 |
C08F20/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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