| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a calixresorcinarene derivative having controllable dissolution rate in an alkali developing liquid, useful as a chemically amplified negative-type resist material giving a pattern having good form in high sensitivity without lowering resolution, a method for producing the derivative, the negative-type resist composition containing the derivative, and a method for forming a pattern by using the negative-type resist composition. <P>SOLUTION: The calixresorcinarene derivative is produced by reacting a resorcinol derivative expressed by chemical formula (1) with an alkyl halide expressed by R<SP>3</SP>-X, thereby introducing a non-acid decomposable group to a phenolic hydroxy group of the resorcinol derivative. In the formula, R<SP>1</SP>is aryl, substituted aryl, alkyl or the like; R<SP>2</SP>is 1C-5C alkyl or the like; and n is an integer of 0-2. <P>COPYRIGHT: (C)2011,JPO&INPIT |
