发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a thin film transistor of stable electric characteristics which uses an oxide semiconductor layer by reducing contact resistance between the oxide semiconductor layer and a source electrode layer or drain electrode layer. <P>SOLUTION: In the thin film transistor that uses the oxide semiconductor layer, a buffer layer having a high resistance region and a low resistance region on the oxide semiconductor layer is formed, and the oxide semiconductor layer and the source electrode layer or drain electrode layer contact each other through the low resistance region of the buffer layer. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010258434(A) 申请公布日期 2010.11.11
申请号 JP20100078542 申请日期 2010.03.30
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 ASANO YUJI;HIZUKA JUNICHI
分类号 H01L29/786;G02F1/1368;H01L21/28;H01L21/336;H01L21/768;H01L29/417;H01L51/50;H05B33/14 主分类号 H01L29/786
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