METHOD FOR MANUFACTURING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a resist pattern by double patterning method.

SOLUTION: The method for manufacturing the resist pattern includes the following steps (1) to (11). (1) A step of obtaining a first resist film by applying a first resist composition containing a crosslinking agent represented by formula (X) onto a substrate and drying the same; (2) a step of performing prebake; (3) a step of performing exposure process; (4) a step of performing post exposure bake; (5) a step of obtaining a first resist pattern by development; (6) a step of performing hard bake; (7) a step of obtaining a second resist film by applying a second resist composition onto the first resist pattern and drying the same; (8) a step of performing prebake; (9) a step of performing exposure process; (10) a step of performing post exposure bake; and (11) a step of obtaining a second resist pattern by development.

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