发明名称 Method and Apparatus for Continuous Coating
摘要 Disclosed is a method and apparatus for continuous coating with a rotational die in which coating materials flow in a radial direction. The linear speed of a substrate in need of coating is identical to the tangential speed of the surface of the rotational die so that the coating material, which flows in a radial direction of the rotational die, flows onto the substrate perpendicularly. Therefore, the ingredients of coating materials overlap one another (or stand vertically as a layer), and the vertical sequence of the coating material is ensured. This method and apparatus can be used to make organic electronic devices, organic light-emitting diodes and organic photovoltaic devices. Particularly, this method and apparatus can be used in bulk-hetero-junction of mixed coating of P-type and N-type semiconductors.
申请公布号 US2010285220(A1) 申请公布日期 2010.11.11
申请号 US20090637415 申请日期 2009.12.14
申请人 ATOMIC ENERGY COUNCIL-INSTITUTE OF NUCLEAR ENERGYRESEARCH 发明人 CHANG HWEI-LANG;CHANG ZONE-SURE
分类号 B05D5/00;B05C5/02 主分类号 B05D5/00
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