发明名称 PROCESS FOR REDUCING RESIDUAL SURFACE MATERIAL FROM POROUS POLYMERS
摘要 The present invention relates to methods for removing residual surface material from porous polymerized particle surfaces. The particles thus produced have an increase in surface porosity and uniformity in a variety of applications. Desirably, substantially the entire surface communicates with the interior of the particles. Also provided are the particles produced by such methods, further modifications of such particles, and methods for using the particles in a variety of applications. All described methods, compositions, and articles of manufacture are within the scope of the invention.
申请公布号 WO2010129623(A2) 申请公布日期 2010.11.11
申请号 WO2010US33641 申请日期 2010.05.04
申请人 SUNSTORM RESEARCH CORPORATION;LI, NAI-HONG;HSUANYU, YUCHIONG;BENSON, JAMES, R. 发明人 LI, NAI-HONG;HSUANYU, YUCHIONG;BENSON, JAMES, R.
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