THIN FILM DEPOSITION APPARATUS AND THIN FILM DEPOSITION SYSTEM COMPRISING SAME

摘要

The present invention provides a thin film deposition apparatus comprising: a transfer chamber for transferring substrates; and a first process chamber and a second process chamber coupled to both sides of the transfer chamber, respectively, wherein each of the first process chamber and the second process chamber includes: a first substrate holder and a second substrate holder spaced apart from each other; and a spray unit interposed between the first substrate holder and the second substrate holder to consecutively supply deposition materials in the direction of the first and second substrate holders. The present invention also provides a thin film deposition system comprising the apparatus. The thus-configured apparatus of the present invention has multiple process chambers which perform the same process and which are connected to both sides of the transfer chamber, respectively, thus performing a thin film process simultaneously on multiple substrates and improving processing speed.