| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having a wide depth of focus and good resistance to pattern peeling. <P>SOLUTION: A polymer includes a repeating unit at least represented by general formula (a-1), a repeating unit represented by general formula (a-2) and includes a GPC weight-average molecular weight ranging from about 1,000 to about 100,000, wherein in general formulae (a-1) and (a-2), R<SP>0</SP>represents an alkyl group having a hydroxy group, R<SP>1</SP>represents a hydrogen atom or the like, and R<SP>2</SP>and R<SP>3</SP>each represents an 1-4C alkyl group. <P>COPYRIGHT: (C)2011,JPO&INPIT |
