发明名称 SUBSTRATE TRANSFER MECHANISM AND SUBSTRATE TRANSFER METHOD
摘要 PROBLEM TO BE SOLVED: To provide a substrate transfer mechanism for fully cooling substrates during transport which is heated in a film-forming device. SOLUTION: The substrate transport mechanism has an array of a first substrate holding member 62a, consisting of suckers and an array of a second substrate holding member 62b consisting of Bernoulli Chucks, and a substrate removable holder 62. The substrate transport mechanism holds the array of film formed substrates 6b on a tray 4 with a second substrate holding member 62b, while holding the array of substrates 6a on a carrying in conveyor 70, before film forming with a first substrate holding member 62a; holds the array of substrates 6a on a carrying in conveyor 70; before film forming with the first substrate holding member 62a; after mounting the substrates 6a held with the first substrate holding member 62a; before film forming on the tray 4; and mounts the film formed substrates 6b, held by the second substrate holding member 62b on a carrying out conveyor 72. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010258460(A) 申请公布日期 2010.11.11
申请号 JP20100107962 申请日期 2010.05.10
申请人 MATSUSHITA TOMOO 发明人 MATSUSHITA TOMOO
分类号 H01L21/677;B65G49/06 主分类号 H01L21/677
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