发明名称 |
Verfahren und Abscheidesystem mit Mehrschrittabscheidesteuerung |
摘要 |
<p>For providing control of two-step or a multi-step deposition process, a method and a corresponding deposition system is provided comprising providing a deposition process having at least two sub-processes employing different sets of process parameters, wherein each set of process parameters comprises at least one process parameter. The method comprises controllably generating an actual value for at least one first process parameter by taking into account at least one previous value of the respective first process parameter, wherein each first process parameter is a process parameter of said at least two sets of process parameters.</p> |
申请公布号 |
DE102007025341(B4) |
申请公布日期 |
2010.11.11 |
申请号 |
DE20071025341 |
申请日期 |
2007.05.31 |
申请人 |
ADVANCED MICRO DEVICES INC. |
发明人 |
JAEGER, ROLAND;WAGENBRETH, FRANK;KOSCHINSKY, FRANK |
分类号 |
H01L21/66;H01L21/283 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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