DEVICE AND METHOD FOR INSPECTING PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a device which performs a pattern inspection for reducing false defects.

SOLUTION: A pattern inspection device 100 includes: an optical image acquisition part 150 which obtains optical image data in a pattern-formed photomask 101; a development circuit 111 which develops design data of a pattern to image data to generate developed image data; a distortion image generation circuit 140 which performs distortion processing to the developed image data to generate distortion image data; a dissimilar index calculation circuit 142 which calculates a dissimilar index showing difference between the developed image data and the distortion image data by each pixel; a reference image generation circuit 112 which performs data processing to the developed image data to generate reference image data to be compared with the optical image data; and a comparison circuit 108 which compares the optical image data with the reference image data under criteria according to the dissimilar index by each pixel.

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