| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a substrate transfer method, for reducing the decline of throughput. SOLUTION: The substrate processing apparatus includes a measurement unit 10 and a transfer mechanism. The measurement unit 10 is provided with a measuring instrument 15 for measuring the state of a substrate W at a prescribed measuring position Pm, a first tray 11, a second tray 12, and a stage 16 for moving the substrate W between the prescribed measuring position Pm and the first tray 11 and the second tray 12. The transfer mechanism is provided with a robot hand 25 having a first holding part 21 and a second holding part 22 for holding the substrate W. Since the robot hand 25 which has mounted the substrate W to the first tray 11 takes out the substrate W after measurement to the outside of the measurement unit 10 without leaving the measurement unit 10, the substrates W before and after the measurement are replaced by the access of one time to the measurement unit 10, and the decline of the throughput is reduced. COPYRIGHT: (C)2011,JPO&INPIT
|
