| 摘要 |
A dual energy inspection system that generates X-rays with an electron beam scanned over targets. A switchable voltage source that can be change its voltage output may cause X-rays to be generated at different energies. This X-ray generation subsystem is controlled by a sequencer that provides beam steering and shaping control inputs that may be dependent on the voltage provided by the voltage source. In another aspect, the dual energy inspection system may use multiple types of detectors, each sensitive to X-rays of a different energy. A relatively small number of detectors sensitive to one energy level is provided. Nonetheless, dual energy measurements may be made on objects within an item under inspection by identifying points that, for each object of interest, provide a low interference path to one of those detectors. Measurements made with radiation emanating from those points are used for dual energy analysis of those objects.
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