| 摘要 |
A dummy rule generating apparatus includes a critical pattern estimating unit that determines a wiring pattern whose total perimeter length of wirings is smaller than an appropriate range based on constraints on the wirings for a circuit layout as a critical pattern. The dummy rule generating apparatus also includes a rule generating unit that generates dummy fill rules of a shape and a layout of dummy metals that increase number of dummy metals inserted in the critical pattern and decrease the number of dummy metals inserted in a wiring pattern whose total perimeter length of wirings is within an appropriate range.
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