发明名称 |
MULTI-BEAM EXPOSURE DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To improve a multi-beam exposure devices for scanning a plurality of beams. SOLUTION: The multi-beam exposure device 1 includes:Σ(Ni-1) pieces of half mirrors 11 for combiningΣNi pieces of light into M pieces of light beam groups; M sets of finite lenses 8 for imparting positive power of a larger absolute value than the main scanning direction in the subscanning direction to be further converged in the subscanning direction; a combining reflecting mirror 13 for reflecting the M pieces of light beam groups so as to substantially overlap in a first direction; a deflector 5 for deflecting the combined M pieces of light beam groups; and dustproof glass 14, inclined in the reverse direction of the inclining direction of the half mirrors, in a front stage of the deflector; and can reduce the influence of coma aberrations applied to the M pieces of light beam groups by the half mirrors. COPYRIGHT: (C)2011,JPO&INPIT
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申请公布号 |
JP2010256916(A) |
申请公布日期 |
2010.11.11 |
申请号 |
JP20100132373 |
申请日期 |
2010.06.09 |
申请人 |
TOSHIBA CORP;TOSHIBA TEC CORP |
发明人 |
SHIRAISHI TAKASHI;YAMAGUCHI MASAO;FUKUTOME YASUYUKI |
分类号 |
G02B26/10;B41J2/44;G02B13/00;H04N1/113 |
主分类号 |
G02B26/10 |
代理机构 |
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主权项 |
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地址 |
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