发明名称 |
Hydraulic-facilitated contact lithography apparatus, system and method |
摘要 |
A contact lithography apparatus, system and method use a hydraulic deformation to facilitate pattern transfer. The apparatus, system and method include a spacer that provides a spaced apart proximal orientation of lithographic elements, and a hydraulic force member that provides the hydraulic deformation. One or more of the lithographic elements and the spacer is deformable, such that hydraulic deformation thereof facilitates the pattern transfer.
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申请公布号 |
US7830498(B2) |
申请公布日期 |
2010.11.09 |
申请号 |
US20060548216 |
申请日期 |
2006.10.10 |
申请人 |
HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. |
发明人 |
GAO JUN;WU WEI;PICCIOTTO CARL |
分类号 |
G03B27/20;G03B27/02;G03B27/58;G03B27/60;G03B27/62;G03B27/64 |
主分类号 |
G03B27/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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