发明名称 Hydraulic-facilitated contact lithography apparatus, system and method
摘要 A contact lithography apparatus, system and method use a hydraulic deformation to facilitate pattern transfer. The apparatus, system and method include a spacer that provides a spaced apart proximal orientation of lithographic elements, and a hydraulic force member that provides the hydraulic deformation. One or more of the lithographic elements and the spacer is deformable, such that hydraulic deformation thereof facilitates the pattern transfer.
申请公布号 US7830498(B2) 申请公布日期 2010.11.09
申请号 US20060548216 申请日期 2006.10.10
申请人 HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 发明人 GAO JUN;WU WEI;PICCIOTTO CARL
分类号 G03B27/20;G03B27/02;G03B27/58;G03B27/60;G03B27/62;G03B27/64 主分类号 G03B27/20
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