发明名称 Gas monitoring apparatus
摘要 A gas monitoring apparatus includes a sample introducing portion, a measurement portion, an ionization portion, a mass analysis portion, a data processing portion and a display. The sample introducing portion introduces a sample gas including an object material to be measured. The measurement portion measures a concentration of a predetermined coexisting material, which coexists with the object material in the sample gas. The ionization portion ionizes the sample gas. The mass analysis portion analyzes mass of an ion produced by the ionization portion. The data processing portion analyzes signals detected by the mass analysis portion to calculate a concentration of the object material. And the display displays results of analysis conducted by the data processing portion. The data processing portion includes an adjustment portion which adjusts the concentration of the object material according to the concentration of the predetermined coexisting material.
申请公布号 US7829848(B2) 申请公布日期 2010.11.09
申请号 US20080285332 申请日期 2008.10.02
申请人 HITACHI, LTD.;NATIONAL RESEARCH INSTITUTE OF POLICE SCIENCE 发明人 TAKADA YASUAKI;SUGA MASAO;NAGANO HISASHI;WAKI IZUMI;OKADA HIDEHIRO;NOJIRI TATSUO;SETO YASUO;SANO YASUHIRO;YAMASHIRO SHIGEHARU;OHSAWA ISAAC
分类号 H01J49/00;B01D59/44 主分类号 H01J49/00
代理机构 代理人
主权项
地址