发明名称 |
Adjustable electrodes and coils for plasma density distribution control |
摘要 |
A adjustable upper coil or electrode for a reaction chamber apparatus useable in semiconductor processing, is constructed so that its shape may be selectively changed or so at least two portions thereof may be selectively driven at different power and/or frequencies. The adjustable upper coil or electrode, therefore, enables the plasma density distribution in the reaction chamber apparatus to be selectively controlled.
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申请公布号 |
US7829815(B2) |
申请公布日期 |
2010.11.09 |
申请号 |
US20060534495 |
申请日期 |
2006.09.22 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
CHEN YING-LIN;KAO CHI-AN;CHEN PO-ZEN;HSIAO YI-LI;YU CHEN-HUA;WANG JEAN;SHEU LAWRANCE |
分类号 |
B23K10/00 |
主分类号 |
B23K10/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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