发明名称 Treatment of laser exposed lithographic printing plate before development
摘要 A method of treating a laser exposed lithographic printing plate with a deactivating solution followed by overall irradiation is described. The plate comprises on a substrate a photosensitive layer capable of photo hardening. The deactivating solution is capable of deactivating the photo hardening capability of the photosensitive layer in the non-hardened areas so that the overall irradiation does not cause hardening of the photosensitive layer in the non-hardened areas. The deactivation and overall irradiation cause one or more chemical or physical changes to the photosensitive layer, such as further hardening of the imaged areas, improved contrast, improved developability, or improved substrate hydrophilicity. The overall irradiated plate is further developed on press with ink and/or fountain solution or off press with a developer. For off-press development, the developer may be used as the deactivating solution.
申请公布号 US7829260(B2) 申请公布日期 2010.11.09
申请号 US20070967961 申请日期 2007.12.31
申请人 TENG GARY GANGHUI 发明人 TENG GARY GANGHUI
分类号 G03F7/00;G03F7/26 主分类号 G03F7/00
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