发明名称 |
Methods and devices for monitoring and controlling thin film processing |
摘要 |
Thin film processing systems and methods are provided having a moving deposition sensor capable of translation and/or rotation in a manner that exposes the sensor to thin film deposition environments in a flux region substantially the same as the deposition environments experienced by one or more moveable substrates during a selected deposition period. In one embodiment, a thin film monitoring and control system is provided wherein one or more moveable substrates and a moveable deposition sensor are moved along substantially coincident trajectories in a flux region of a thin film deposition system for a selected deposition period. Systems and methods of the present invention may include SC-cut quartz crystal microbalance sensors capable of excitation of at least two different resonant modes.
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申请公布号 |
US7828929(B2) |
申请公布日期 |
2010.11.09 |
申请号 |
US20050314811 |
申请日期 |
2005.12.21 |
申请人 |
RESEARCH ELECTRO-OPTICS, INC. |
发明人 |
LEE WILLIAM DAVID;NESS DALE C.;STREATER ALAN D. |
分类号 |
C23F1/00;H01L21/306 |
主分类号 |
C23F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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