发明名称 Methods and devices for monitoring and controlling thin film processing
摘要 Thin film processing systems and methods are provided having a moving deposition sensor capable of translation and/or rotation in a manner that exposes the sensor to thin film deposition environments in a flux region substantially the same as the deposition environments experienced by one or more moveable substrates during a selected deposition period. In one embodiment, a thin film monitoring and control system is provided wherein one or more moveable substrates and a moveable deposition sensor are moved along substantially coincident trajectories in a flux region of a thin film deposition system for a selected deposition period. Systems and methods of the present invention may include SC-cut quartz crystal microbalance sensors capable of excitation of at least two different resonant modes.
申请公布号 US7828929(B2) 申请公布日期 2010.11.09
申请号 US20050314811 申请日期 2005.12.21
申请人 RESEARCH ELECTRO-OPTICS, INC. 发明人 LEE WILLIAM DAVID;NESS DALE C.;STREATER ALAN D.
分类号 C23F1/00;H01L21/306 主分类号 C23F1/00
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