发明名称 Method and system for yield similarity of semiconductor devices
摘要 Method and system for yield similarity of semiconductor devices. Embodiments of the present invention provides a method for yield similarity of semiconductor devices. The method includes providing a first plurality of semiconductor devices and a second plurality of semiconductor devices. The method also includes obtaining a first plurality of yields associated with a first yield related to the first plurality of semiconductor devices. The method further includes obtaining a second plurality of yields associated with a second yield related to the second plurality of semiconductor devices. The method also includes providing a processor and performing a first statistical analysis for the first plurality of yields using at least the processor. The method includes determining a first statistical distribution based on at least information associated with the first statistical analysis. The method includes performing a second statistical analysis for the second plurality of yields.
申请公布号 US7831409(B2) 申请公布日期 2010.11.09
申请号 US20070853794 申请日期 2007.09.11
申请人 SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION 发明人 WANG EUGENE
分类号 G06F17/18 主分类号 G06F17/18
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