APPARATUS FOR CLEANING GLASS

摘要

PURPOSE: A substrate cleaning apparatus is provided to reduce a failure rate due to a foreign material by easily removing a foreign material which is fallen from the surface of the substrate. CONSTITUTION: A one polishing unit(100) polishes a foreign material remaining on the surface of a substrate before the substrate is washed. A cleaning unit cleans the substrate where a polishing process is completed by being arranged behind the polishing unit. A polishing pad(110) is arranged to be spaced apart from the substrate in order to remove a foreign material on the surface of the substrate. A pad driving part(130) is connected to the polishing pad.