发明名称 |
SILICON WAFER CLEANING AGENT |
摘要 |
<p>A silicon wafer cleaning agent includes at least a water-based cleaning liquid, and a water-repellent cleaning liquid for providing water-repellent to an uneven pattern at least at recessed portions during a cleaning process. The water-repellent cleaning liquid is a liquid composed of a water-repellent compound containing a reactive moiety which is chemically bondable to Si in the silicon wafer, and a hydrophobic group, or is a liquid wherein 0.1 mass % or more of the water-repellent compound relative to the total quantity of 100 mass % of the water-repellent cleaning liquid and an organic solvent are mixed and contained therein. A cleaning process wherein a pattern collapse is easily induced can be improved by using the cleaning agent.</p> |
申请公布号 |
KR20100119586(A) |
申请公布日期 |
2010.11.09 |
申请号 |
KR20107022407 |
申请日期 |
2010.01.15 |
申请人 |
CENTRAL GLASS COMPANY, LIMITED |
发明人 |
KUMON SOICHI;SAITO MASANORI;SAIO TAKASHI;NANAI HIDEHISA;AKAMATSU YOSHINORI |
分类号 |
H01L21/302 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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