| 摘要 |
PURPOSE: A substrate processing apparatus with a shutter unit is provided to completely block the diffusion of liquid atmosphere by forming a sealing unit to a space between the shutter unit and the sidewall of a processing chamber. CONSTITUTION: A first processing chamber(200) is perform chemical treatment with respect to a substrate. Second processing chambers(100, 300) perform non-chemical treatment with respect to the substrate. The second processing chambers include internal spaces(110, 310) for processing the treatment with respect to each substrate. Openings(211, 261) are in connection with the internal space(210) of the first processing chamber. Shutter units(400, 500) are installed to the sidewall of the first processing chamber in order to open and close each opening.
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