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发明名称
PROCESS FOR CLEANING A SEMICONDUCTOR WAFER USING A CLEANING SOLUTION
摘要
申请公布号
KR100992479(B1)
申请公布日期
2010.11.08
申请号
KR20080052073
申请日期
2008.06.03
申请人
发明人
分类号
H01L21/304
主分类号
H01L21/304
代理机构
代理人
主权项
地址
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