FLOOD EXPOSURE PROCESS FOR DUAL TONE DEVELOPMENT IN LITHOGRAPHIC APPLICATIONS
摘要
<p>A method and system for patterning a substrate using a dual tone development process is described. The method and system comprise a flood exposure of the substrate to improve process latitude for the dual tone development process.</p>
申请公布号
WO2010126735(A1)
申请公布日期
2010.11.04
申请号
WO2010US31607
申请日期
2010.04.19
申请人
TOKYO ELECTRON LIMITED;FONSECA, CARLOS, A.;SOMERVELL, MARK;SCHEER, STEVEN;PRINTZ, WALLACE, P.
发明人
FONSECA, CARLOS, A.;SOMERVELL, MARK;SCHEER, STEVEN;PRINTZ, WALLACE, P.
