Positive Resistzusammensetzung und Strukturierungsverfahren
摘要
A positive resist composition comprises a polymer comprising recurring units having a sulfonium salt incorporated therein as a base resin which becomes soluble in alkaline developer under the action of acid. The polymer generates a strong sulfonic acid upon exposure to high-energy radiation so as to facilitate effective scission of acid labile groups in the resist composition.
申请公布号
DE602009000202(D1)
申请公布日期
2010.11.04
申请号
DE20096000202T
申请日期
2009.02.11
申请人
SHIN-ETSU CHEMICAL CO. LTD.
发明人
OHSAWA, YOUICHI;KINSHO, TAKESHI;OHASHI, MASAKI;TACHIBANA, SEIICHIRO;WATANABE, TAKERU;HATAKEYAMA, JUN