| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent an image error such as an intensity imbalance between adjacent bright lines in a projected pattern, which may occur due to mask pattern surface topography although a mask is used to print the pattern. <P>SOLUTION: A projection system PS may include an optical phase adjuster 310 so as to help alleviate or eliminate the problem of intensity imbalance. The optical phase adjuster 310 is constructed and arranged to adjust a phase of an electric field of optical radiation beam DB traversing the adjuster 310. A reduction of intensity imbalance is achieved by suitably adjusting the phases of diffraction radiations DB of the 0th order, plus first-order and minus first-order radiated from the mask pattern. By adjusting the phase differently for different portions of the illumination, the method can be applied such that no decrease of depth of focus due to, for example, the 0th order occurs. <P>COPYRIGHT: (C)2011,JPO&INPIT |
