| 摘要 |
<P>PROBLEM TO BE SOLVED: To increase lyophobic properties of an immersion lithography apparatus surface. <P>SOLUTION: The immersion lithography apparatus has a surface contacted by an immersion liquid when used, and the surface has a surface roughness of 0.2 μm or less. The immersion liquid on the surface may have a contact angle of 60 degrees or higher. The surface may maintain the characteristic so that the immersion liquid has the contact angle enabling the immersion for a long period of time. <P>COPYRIGHT: (C)2011,JPO&INPIT |
