发明名称 LGA SUBSTRATE AND METHOD OF MAKING SAME
摘要 A transistor comprises a gate (110) comprising a gate electrode (111) and a gate dielectric (112), an electrically insulating cap (120, 720) over the gate, and a source/drain contact (130) adjacent to the gate. The electrically insulating cap prevents electrical contact between the gate and the source/drain contact. In one embodiment, the electrically insulating cap is formed in a trench (160, 660) that is self-aligned to the gate and that is created by the removal of a sacrificial cap using an aqueous solution comprising a carboxylic acid and a corrosion inhibitor.
申请公布号 US2010276763(A1) 申请公布日期 2010.11.04
申请号 US20100836829 申请日期 2010.07.15
申请人 RACHMADY WILLY;RAMACHANDRARAO VIJAY;GOLONZKA OLEG;FAJARDO ARNEL M 发明人 RACHMADY WILLY;RAMACHANDRARAO VIJAY;GOLONZKA OLEG;FAJARDO ARNEL M.
分类号 H01L29/78 主分类号 H01L29/78
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