| 摘要 |
A photomask is provided that includes a transparent substrate having a pattern region and a pellicle frame-mounting region formed thereon, wherein the pellicle frame-mounting region is formed outside the outer periphery of the pattern region, and at least the pellicle frame-mounting region is covered with a light shielding film. Specifically, there is provided a pellicle-equipped photomask comprising a photomask comprising a pellicle frame-mounting region covered with a light shielding film formed outside the outer periphery of the pattern region on a transparent substrate; and a pellicle comprising at least a pellicle film and a pellicle frame, the pellicle frame being mounted on the pellicle frame-mounting region.
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