| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography apparatus, with improved emergency policy. <P>SOLUTION: A positioning system for the lithography apparatus includes a control system which positions a movable object of the lithographic apparatus, at least in one direction substantially parallel with a frame; the control system includes a measuring system which measures the position of the movable object, an actuator which gives force to the movable object, and a controller which supplies the actuator with a drive signal, based on the output from the measuring system; and the positioning system further comprises an emergency braking system which detects failure of the control system, and upon detecting a failure, makes the control system disabled and pulls the movable object relative to the frame. <P>COPYRIGHT: (C)2011,JPO&INPIT |
