发明名称 GAS-BARRIER FILM AND METHOD FOR PRODUCING THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a gas-barrier film which has high interlayer adhesion and is excellent in gas-barrier properties and a method for producing the same. <P>SOLUTION: In the gas-barrier film, at least two layers of a laminate in which an organic layer and an inorganic layer are formed in turn are laminated on a substrate. Out of the organic layers, the first organic layer which is directly formed on the substrate has a glass transition temperature of at least 200°C, is constituted of a (meth)acrylic compound having a C-C bond density in a monomer of at least 0.19, and has a thickness of≥300 nm and <1,000 nm. Out of the organic layers, the second organic layer other than the first organic layer has a glass transition temperature of at least 105°C, is constituted of a (meth)acrylic compound having a C-C bond density in a monomer of at least 0.19, and has a thickness of≥50 nm and <300 nm. The inorganic layer is formed through a film forming method using plasma. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2010247335(A) 申请公布日期 2010.11.04
申请号 JP20090095929 申请日期 2009.04.10
申请人 FUJIFILM CORP 发明人 KIKUCHI TOMOYUKI
分类号 B32B9/00;B32B27/30;C23C14/24;C23C16/42 主分类号 B32B9/00
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