发明名称 SURFACE TREATMENT METHOD FOR ZINC OXIDE SUBSTRATE AND METHOD FOR MANUFACTURING ZINC OXIDE CRYSTAL
摘要 PROBLEM TO BE SOLVED: To provide a surface treatment method of a zinc oxide substrate for obtaining the zinc oxide substrate which is excellent in the cleanliness and flatness of the surface and a method for manufacturing zinc oxide crystal by using the zinc oxide substrate treated by the same method. SOLUTION: The surface treatment method of the zinc oxide substrate 3 irradiates the surface of the zinc oxide substrate 3 heated in a vacuum chamber 13 with a gallium molecular beam from a gallium evaporation source 11, and etches the surface of the zinc oxide substrate 3. The method for manufacturing zinc oxide crystal treats the surface of the zinc oxide substrate 3 by the method, and to make the zinc oxide crystal grow by a zinc source 6 and a plasma excitation oxygen source 56 on the surface. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010251633(A) 申请公布日期 2010.11.04
申请号 JP20090101681 申请日期 2009.04.20
申请人 FUJIKURA LTD 发明人 KAIBUCHI YOSHIKAZU;YOSHIKAWA AKIHIKO
分类号 H01L21/363;C23C14/02;C23C14/08;H01L21/3065 主分类号 H01L21/363
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