METHOD OF MANUFACTURING DISPLAY DEVICE, AND DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a display device that can be decreased in rate of remaining of amorphous silicon due to microcrystallization, and improved in production efficiency. SOLUTION: The method of manufacturing the display device includes: a first semiconductor laminating step of forming a first semiconductor layer of amorphous silicon; a second semiconductor laminating process of forming a second semiconductor layer which comes into contact with the first semiconductor layer and to which an impurity is added; and a microcrystallization step of making at least part of the first semiconductor layer microcrystalline by heating the first semiconductor layer, the microcrystallization step being implemented after the second semiconductor layer laminating step. COPYRIGHT: (C)2011,JPO&INPIT