发明名称 OXIDE-SEMICONDUCTOR TARGET, AND METHOD FOR MANUFACTURING OXIDE-SEMICONDUCTOR DEVICE USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide an oxide-semiconductor target having a correct Zn/(Zn+Sn) composition of a ZTO (zinc-tin composite oxide)-based oxide-semiconductor material which has high mobility and the stability of a threshold potential, and is little restricted by the aspect of costs, resources and a process, and to provide an oxide-semiconductor device using the same. <P>SOLUTION: A sintered compact of the zinc-tin composite oxide in which the Zn/(Zn+Sn) composition is 0.6-0.8 is used as the target. In addition, the resistivity of the target itself is controlled to 1 &Omega;cm or more which is high resistance. Furthermore, a total concentration of impurities is controlled to 100 ppm or less. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010248547(A) 申请公布日期 2010.11.04
申请号 JP20090096937 申请日期 2009.04.13
申请人 HITACHI METALS LTD 发明人 UCHIYAMA HIROYUKI;WAKANA HIRONORI;KAWAMURA TETSUSHI;KURITA FUMI;FUKUSHIMA HIDEKO
分类号 C23C14/34;C04B35/453;H01L21/336;H01L21/363;H01L21/8246;H01L27/105;H01L29/786 主分类号 C23C14/34
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