| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition exhibiting excellent resolution with which a resist pattern having a good shape is formed, and to provide a method for forming a resist pattern. <P>SOLUTION: The positive resist composition includes a base component (A) which exhibits increased solubility in an alkali developing solution under an action of an acid, and an acid generator component (B) which generates an acid upon exposure. The base component (A) includes a polymeric compound (A1) having an acrylate structural unit (a0) having a side chain and expressed by general formula -R<SP>2</SP>-C(=O)-O-R<SP>1</SP>(wherein R<SP>1</SP>represents an acid dissociable dissolution inhibiting group and R<SP>2</SP>represents a divalent hydrocarbon group). The acid generator component (B) includes an acid generator (B1) having an anionic moiety expressed by general formula (I) (wherein X represents a 3-30C hydrocarbon group, Q<SP>1</SP>represents a divalent linking group containing an oxygen atom, and Y<SP>1</SP>represents a 1-4C alkylene group or 1-4C fluorinated alkylene group). <P>COPYRIGHT: (C)2011,JPO&INPIT |
