发明名称 |
PLANT AND METHOD FOR REMOVING XENOBIOTICS FROM WATER USING UV-V RADIATION |
摘要 |
<p>The present invention relates to a method for removing xenobiotics present in water during the treatment thereof in water treatment plants or in drinkable water production plants comprising applying a UV-V radiation having a wavelength between 100 and 200 nanometers. A UV-C radiation having a wavelength between 200 and 280 nanometers can also be applied in combination with the UV-V radiation. The invention also relates to a device for implementing said method, wherein said device comprises: a least one reactor; inside the reactor(s), at least one lamp module capable of emitting a radiation having a wavelength between 100 and 200 nanometers and operating in series and/or in parallel and optionally coupled to at least one lamp module capable of emitting a radiation having a wavelength between 200 and 280 nanometers; at least one system for adjusting the water level in the reactor(s); at least one device for powering, controlling and adjusting the lamps; and at least one device for supplying pressurized air or dioxygen.</p> |
申请公布号 |
WO2010125251(A1) |
申请公布日期 |
2010.11.04 |
申请号 |
WO2009FR50800 |
申请日期 |
2009.04.30 |
申请人 |
LOIRA |
发明人 |
OLIVEROS, ESTHER;BRAUN, ANDRE;MAURETTE, MARIE-THERESE;BENOIT MARQUIE, FLORENCE;DEBUIRE, JACQUES |
分类号 |
C02F1/32 |
主分类号 |
C02F1/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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