| 摘要 |
Disclosed is a photomask for near-field exposure, that includes a light blocking film having a group of small openings being arrayed and each having an opening width not greater than a wavelength of exposure light, wherein a shape and/or disposition of the small-opening group is set so that near-field light escaping from the small openings in response to projection of exposure light to the small openings has approximately even light intensity distributions. |
